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By Richard C. Alkire, Dieter M. Kolb

Quantity 7 within the well-established sequence "Advances in Electrochemical technology and Engineering" covers - between others - vital issues on electrodeposition. As in all prior volumes, the editors have succeeded in identifying hugely topical parts of electrochemical learn and in offering authors who're leaders of their fields. the result's a compelling set of stories which serves both good as a good and updated resource of knowledge for knowledgeable researchers energetic within the box in addition to an advent for rookies. From experiences of the former volumes: 'This is a vital ebook for researchers in electrochemistry; it covers components of either primary and sensible value, with reports of top of the range. the cloth is particularly good provided and the alternative of subject matters displays a balanced editorial coverage that's welcomed.' The Analyst 'All the contributions during this quantity are good as much as the traditional of this wonderful sequence and should be of significant worth to electrochemists... The editors back should be congratulated in this fantastic choice of reviews.' magazine of Electroanalytical Chemistry and Interfacial Chemistry '...competently and obviously written.' Berichte der Bunsen- Gesellschaft fur Physikalische Chemie

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In addition, the TLEC facilitated solution exchange, central to studies of EC-ALE. One solution can be ¯ushed out, and another rinsed in in a second, without exposing the deposit to air. The TLEC was used to determine the potentials needed to form atomic layers of the elements on the substrate. Following the co-deposition work of Kroger et al. [35], and many others, acidic solutions of HTeO‡ 2 were initially used [73, 74]. At that time, it was assumed that if Cd was deposited by reductive UPD, Te should be deposited using oxidative UPD, from a solution of H2 Te or a related telluride species.

The range of compounds accessible by EC-ALE is not clear. The majority of work has been performed on II±VI compounds (Table 1). The III±V compounds InAs and InSb have recently been formed, and the ®rst deposits of a III±VI compound, InSe, have been made [151]. In addition, Shannon et al. have begun studies of CoSb3 [152] with the intent of forming thermoelectric materials. Initially, EC-ALE was developed on the principle that reductive UPD of a metal and oxidative UPD of a main group element were required to form a working cycle.

0 V (Figure 9B) in order to avoid bulk deposition. 6 V. Cd atomic layers, however, will strip during the Te deposition step. 5 V, where the Cd remains stable, but some bulk Te is formed along with the Te…UPD† : ‡ 0 À 2HTeO‡ 2 ‡ 6H ‡ 8e 6 Te ‡ Te…UPD† ‡ 4H2 OX …4† The trick is that bulk Te (Te 0 ), can be stripped at a more negative potential in a supporting electrolyte (blank) solution. In this way, only Te…UPD† is left, due to stabilization by bonding with previously deposited Cd, forming CdTe: Te 0 ‡ Te…UPD† ‡ 2H‡ ‡ 2eÀ 6 Te…UPD† ‡ H2 TeX …5† Equations 4 and 5 together have essentially the same result as Equation 3, oxidative UPD or the formation of a Te atomic layer.

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