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By Kash L. Mittal

This booklet chronicles the lawsuits of the 1st foreign Symposium on Adhesion elements of skinny motion pictures held below the auspices of MST meetings in Newark, New Jersey, October 28-29, 1999.

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Adhesion Aspects of Thin Films

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3. R. W. Hoffman, in: Physics of Non-Metallic Thin Films, NATO Advanced Study Institute Series B, Vol. 14, C. H. S. Dupuy and A. Cachard (Eds), p. 273. Plenum, New York (1976). 4. K. Kinosita, Thin Solid Films 50, 205 (1978). 5. M. F. Doerner and W. D. Nix, CRC Crit. Rev. Solid State Mater. Sci. 14, 225 (1988). 6. M. Ohring, The Materials Science ofThin Films, Chap. 9. Academic, Boston (1992). 7. R. Koch, J. Phys. Condens. Mater. 6, 9519 (1994). 8. F. A. Doljack and R. W. Hoffman, Thin Solid Films 12,71 (1972).

A. Doljack and R. W. Hoffman, Thin Solid Films 12,71 (1972). 9. W. D. Nix and B. M. Clemens, J. Mater. Res. 14, 3471 (1999). 10. R. Abermann, R. Kramer and J. Maser, Thin Solid Films 52,215 (1978). 11. R. Koch and R. Abermann, Thin Solid Films 129,71 (1985). 12. R. Abermann, Thin Solid Films 186, 233 (1990). 13. R. Abermann, Vacuum 41, 1279 (1990). 14. R. Abermann, Mater. Res. Symp. Proc. 239,25 (1992). 15. M. Laugier, Vacuum 31, 155 (1981). 16. R. C. Cammarata, Prog. Surf: Sci. 46, 1 (1994). 17.

Harper, C. R. Guarnieri, D. S. Yee, L. J. Attanasio, J. Angilello, C. T. Wu and R. H. Hammond, J. Vac. Sci. Technol. 20, 349 (1982). Adhesion Aspects of Thin Films, Vol. 1, pp. 5 1 -65 Ed. K. L. *, STURE HOGMARK' and JENS GUNNARS ' Department of Materials Science, Uppsala Universiy, SE-751 21 Uppsala, Sweden * Det Norske Veritas, PO. Box 49306, SE-100 29 Stockholm, Sweden Abstract-Most of today's thin ceramic coatings generated by PVD or CVD techniques are in a residual stress state. This state has a number of origins and will be of either tensile or compressive nature.

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